CVD是英语中的词语，全称为Chemical Vapor Deposition，中文翻译为化学气相沉积。它是一种利用化学反应将气态物质沉积成固态薄膜的技术，常用于制备具有特定性质的材料。
以下是9个含有CVD的例句：
1. The diamond film was prepared by CVD method. (通过CVD方法制备了金刚石膜。)
2. CVD technology is widely used in semiconductor industry. (CVD技术广泛用于半导体工业中。)
3. The quality of CVD film depends on the reaction conditions. (CVD膜的质量取决于反应条件。)
4. CVD can be used to deposit thin films with high purity. (CVD可以用于沉积高纯度的薄膜。)
5. The thickness of CVD film can be controlled by adjusting the deposition time. (通过调节沉积时间可以控制CVD膜的厚度。)
6. CVD is a useful technique for producing coatings with good adhesion. (CVD是生产具有良好附着性的涂层的有用技术。)
7. The CVD process involves the reaction of precursor gases on a substrate surface. (CVD过程涉及前体气体在基底表面上的反应。)
8. CVD can be used to deposit a variety of materials including metals, ceramics and semiconductors. (CVD可以用于沉积多种材料，包括金属、陶瓷和半导体材料。)
9. The CVD technique can be used to produce thin films with precise control over composition and structure. (CVD技术可以用于生产组成和结构精确可控的薄膜。)
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